Reliability of Al2O3-doped ZrO2 high-k dielectrics in three-dimensional stacked metal-insulator-metal capacitors
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چکیده
stacked metal-insulator-metal capacitors Dayu Zhou, U. Schroeder, Jin Xu, J. Heitmann, G. Jegert, W. Weinreich, M. Kerber, S. Knebel, E. Erben, and T. Mikolajick NaMLab gGmbH, Noethnitzer Str. 64, 01187 Dresden, Germany Fraunhofer Center Nanoelectronic Technologies, Koenigsbruecker Str. 180, 01099 Dresden, Germany Institute for Nanoelectronics, TU Munich, Arcisstr. 21, 80333 Munich, Germany Infineon Technologies AG, Otto-Hahn-Ring 6, 81739, Munich, Germany Chair of Nanoelectronic Materials, TU Dresden, Noethnitzerstrasse 64, 01187 Dresden, Germany
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تاریخ انتشار 2010